Intern – Process Engineering, Chemical Vapour Deposition (CVD)

Job description

Our vision is to transform how the world uses information to enrich life for all.

Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing.

Project Description:
Crater defects in the tetraethyl orthosilicate chemical vapour deposition process present potential yield and integration challenges in a high-volume manufacturing environment. This project will focus on developing an understanding of crater defect mechanisms through structured data review and analysis.
 

The intern will explore process behaviour, defect characteristics, and key parameters within the chemical vapour deposition process, building foundational knowledge in semiconductor manufacturing, data analysis, and process engineering.

Project Scope:

• Gain understanding of the tetraethyl orthosilicate chemical vapour deposition process flow and chamber conditions
• Analyse inline defect and yield datasets to study crater defect characteristics and trends
• Observe structured experiment setups (design of experiment or split runs) conducted under engineering guidance
• Evaluate relationships between defect behaviour and film performance metrics through data analysis
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